▎ 摘　　要

NOVELTY - The apparatus has a gas supply unit (130) which is placed in side of laser generator (120) for spraying the sealed gas on amorphous carbon layer (111). The laser generator is equipped in upper side of a substrate (110). The amorphous carbon layer is deposited in upper side of substrate which irradiates the laser beam in amorphous carbon. USE - Graphene forming apparatus. ADVANTAGE - The pattern is etched in transcription process. The surface resistance and transparency are controlled and graphene film is formed into large area. The electric resistance in graphene film is controlled effectively. DETAILED DESCRIPTION - An INDEPENDENT CLAIM is included for graphene film manufacturing method. DESCRIPTION OF DRAWING(S) - The drawing shows a schematic diagram of the graphene film manufacturing device. Substrate (110) Amorphous carbon layer (111) Graphene film (112) Laser generator (120) Gas supply unit (130)