• 专利标题:   Method for manufacturing graphene based saturable absorption mirror, involves forming graphene on large area substrate, plating silicon dioxide protective layer on surface of graphene, and forming large area substrate by metal foil.
  • 专利号:   CN103368058-A, CN103368058-B
  • 发明人:   HU W, LI W, YI L, ZHENG R
  • 专利权人:   UNIV SHANGHAI JIAOTONG
  • 国际专利分类:   B82Y020/00, G02F001/35, H01S003/11
  • 专利详细信息:   CN103368058-A 23 Oct 2013 H01S-003/11 201402 Pages: 7 Chinese
  • 申请详细信息:   CN103368058-A CN10312487 23 Jul 2013
  • 优先权号:   CN10312487

▎ 摘  要

NOVELTY - The method involves forming graphene on a large area substrate. A silicon dioxide protective layer is plated on a surface of the graphene. The large area substrate is formed by a metal foil that is selected from one among a copper foil, a gold foil, a silver foil and an aluminum foil. A chemical vapor deposition process is carried out for forming the graphene on the large area substrate, where the graphene is made of one among a single layer, a double layer or multiple layers. USE - Method for manufacturing a graphene based saturable absorption mirror. ADVANTAGE - The method enables providing high saturation intensity, rapid recovery time and better environmental-friendly effect, constructing a mirror in simple and easy manner, maintaining integrity of a chemical structure, preventing damage of the graphene, reducing impurities by using the silicon dioxide protection layer and production cost, and realizing large scale industrial production and packaging. DETAILED DESCRIPTION - An INDEPENDENT CLAIM is also included for a graphene based saturable absorption mirror. DESCRIPTION OF DRAWING(S) - The drawing shows a sectional view of a graphene based saturable absorption mirror.