▎ 摘　　要

NOVELTY - The manufacturing method involves providing substrate (S101), forming silicon dioxide layer with voids and nucleation points for providing antireflection on substrate surface (S102), forming hexagonal graphene honeycomb lattice on silicon dioxide layer (S103), and forming antireflection film using graphene as growth substrate (S104), such that lower surface of antireflection film has hexagonal shape, and upper surface of antireflection film has diffusion length gradually reduced along with prolonged growth time through gradual growth. USE - Manufacturing method for nano structure antireflection film used for display device (claimed), such as liquid crystal display device. ADVANTAGE - The antireflection film with nano structure with certain reflection reducing effect can be manufactured with high precision by simple process and at low cost. The display device uses nano structure antireflection film as cover glass surface to reduce influence of reflection under strong light environment on display effect. DESCRIPTION OF DRAWING(S) - The drawing shows a flowchart of the manufacturing method for nano structure antireflection film. Providing substrate (S101) Forming silicon dioxide layer with voids and nucleation points for providing antireflection on substrate surface (S102) Forming hexagonal graphene honeycomb lattice on silicon dioxide layer (S103) Forming anti-reflection film using graphene as growth substrate (S104)