▎ 摘　　要

NOVELTY - Preparing graphene film comprises adjusting catalyst on silicon carbide substrate to obtain reaction sample, heating the reaction sample at first preset temperature and allowing to stand, and dissolving the silicon atoms contained in the silicon carbide substrate in the liquid catalyst. The melting point of the catalyst is lower than a first preset temperature. USE - The graphene film is useful in electronic devices. ADVANTAGE - The method does not utilize additional gaseous carbon source; and has reduced process difficulty.