▎ 摘　　要

NOVELTY - Preparing photo-sensitive graphene involves subjecting graphene to Hummer's oxidation treatment to obtain graphene oxide. The obtained graphene oxide is added to a solution of 3-aminopropyl triethoxysilane and heated to 60 degrees C with stirring for 6-12 hours. The product is washed and dried to give an amino modified graphene oxide. The amino modified graphene oxide is dispersed in a solvent and stirred with a reducing agent, heated at 80 degrees C for 12-48 hours. The resultant is washed and dried to obtain amino graphene. USE - Photo-sensitive graphene is used in light curing materials. ADVANTAGE - The photosensitive graphene has improved electrical properties. DETAILED DESCRIPTION - Preparing photo-sensitive graphene involves subjecting graphene to Hummer's oxidation treatment to obtain graphene oxide. The obtained graphene oxide is added to a solution of 3-aminopropyl triethoxysilane and heated to 60 degrees C with stirring for 6-12 hours. The product is washed and dried to give an amino modified graphene oxide. The amino modified graphene oxide is dispersed in a solvent and stirred with a reducing agent, heated at 80 degrees C for 12-48 hours. The resultant is washed and dried to obtain amino graphene. Isophorone diisocyanate is heated to 50 degrees C followed by addition of solution of 2-hydroxyethyl acrylate, catalyst, mixture of polymerization inhibitor to control polymerization at 50 degrees C to obtain a half-blocked isophorone diisocyanate. Amine modified graphene is dispersed in a reaction solvent with half blocked isophorone diisocyanate at 10-40 degrees C with stirring for 20-24 hours. The resultant product is washed and dried to obtain a photosensitive graphene. DESCRIPTION OF DRAWING(S) - The drawing shows schematic presentation of preparation of photosensitive graphene.