▎ 摘　　要

NOVELTY - Graphene surface plasma modification processing device comprises a vacuum chamber (1), a glass container (2), a radio frequency power supply system (9), a counter electrode (10) and a rotating mechanism. The vacuum chamber is a horizontal structure provided with an inflation hole (5) and an air suction hole. The counter electrode is connected to the RF power system. The counter electrode has a circular arc structure. A inner arc portion is a discharge layer. A middle portion is an insulation layer. A outer arc portion is a shield layer. A counter electrode is a cylindrical glass container is placed in the middle. The counter electrode is fixed to the inner wall of the vacuum chamber by a polytetrafluoroethylene block and coaxial with the center of the glass container. The glass container is connected to a rotating mechanism, and one end of the glass container is provided with a through hole. USE - Used as graphene surface plasma modification processing device. DETAILED DESCRIPTION - An INDEPENDENT CLAIM is also included for processing graphene surface plasma modification processing device. DESCRIPTION OF DRAWING(S) - The drawing shows a schematic representation of the graphene surface plasma modification processing device. Vacuum chamber (1) Glass container (2) Inflation hole (5) Radio frequency power supply system (9) Counter electrode (10)