• 专利标题:   Liquid phase fluorine intercalation of silicon surface silicon carbide epitaxial graphene comprises e.g. immersing cleaned sample to be intercalated in mixed acid solution, adding molybdenum metal, reacting, cleaning, and drying.
  • 专利号:   CN103130215-A, CN103130215-B
  • 发明人:   LI Y, LIU J, CHEN Y, HAO X, LI P, WANG Z, ZHANG W
  • 专利权人:   UNIV CHINA ELECTRONIC SCI TECHNOLOGY
  • 国际专利分类:   C01B031/04
  • 专利详细信息:   CN103130215-A 05 Jun 2013 C01B-031/04 201377 Pages: 6 Chinese
  • 申请详细信息:   CN103130215-A CN10068741 05 Mar 2013
  • 优先权号:   CN10068741

▎ 摘  要

NOVELTY - Liquid phase fluorine intercalation of silicon surface silicon carbide epitaxial graphene comprises (i) cleaning epitaxial sample to be intercalated grown on a silicon surface silicon carbide substrate; (ii) preparing a mixed acid solution of hydrofluoric acid and concentrated nitric acid; (iii) immersing the sample to be intercalated in mixed acid solution, adding molybdenum metal, performing strong reaction on mixed acid solution and metal molybdenum to obtain nitrogen dioxide gas; and (iv) continuing the step (iii) process for 10-20 hours, taking the sample out, cleaning and drying. USE - The method is useful for liquid phase fluorine intercalation of silicon surface silicon carbide epitaxial graphene (claimed). ADVANTAGE - The method: is simple; and has low equipment requirement and large application potential in the industrial production field. DETAILED DESCRIPTION - Liquid phase fluorine intercalation of silicon surface silicon carbide epitaxial graphene comprises (i) cleaning epitaxial sample to be intercalated grown on a silicon surface silicon carbide substrate to remove the pollutants to be intercalated on a layer surface of the sample; (ii) preparing a mixed acid solution of 47-51% hydrofluoric acid and 65% concentrated nitric acid according to volume ratio of 1:1; (iii) immersing the sample to be intercalated in mixed acid solution at room temperature, adding molybdenum metal under good ventilation environment, performing strong reaction on mixed acid solution and metal molybdenum to obtain large amount of nitrogen dioxide gas; and (iv) continuing the step (iii) process for 10-20 hours, taking the sample out, cleaning and drying to obtain the epitaxial graphene sample to be intercalated grown on the silicon surface silicon carbide substrate after intercalation treatment.