• 专利标题:   Patterned graphene film for use in electronics and mechanics, has patterned substrate comprising patterned fine-grained metal or alloy layer with multiple discrete regions which structure of metal is selectively changed to amorphous.
  • 专利号:   US2023012266-A1
  • 发明人:   ZAKAR E S
  • 专利权人:   U S ARMY COMBAT CAPABIITIES DEV COMMAND
  • 国际专利分类:   C01B032/186, H01L021/02, H01L029/16
  • 专利详细信息:   US2023012266-A1 12 Jan 2023 H01L-029/16 202307 English
  • 申请详细信息:   US2023012266-A1 US947514 19 Sep 2022
  • 优先权号:   US748364, US947514

▎ 摘  要

NOVELTY - The film has a first region of either no graphene, 1-LG graphene or 2-LG germanium; and a second region of neither graphene, one-LG or two- LG graphene, where the graphene in the first region and second region are different. The patterned substrate comprises a patterned fine-grained metal or alloy layer with multiple discrete regions which the structure of the metal is selectively changed to amorphous, mixed texture, and/or single texture from the initial uniform textured structure. The substrate comprises an oxidized silicon substrate. USE - Patterned graphene film for use in electronics and mechanics. ADVANTAGE - The film utilizes a tunable metal as a catalyst for graphene growth, where the metal layer contains precisely defined textures that control the formation of the graphene film, and a texture can be created to form maskless patterns of graphene. DETAILED DESCRIPTION - INDEPENDENT CLAIMS are also included for: (1) a patterned substrate; (2) a method for applying patterned graphene film. DESCRIPTION OF DRAWING(S) - The drawing shows a schematic view of a patterned graphene film. 106Metal 208Metal structure