• 专利标题:   Preparation of graphene nano mesh involves using patterned substrate to imprint substrate/graphene, and penetrating convex pattern of patterned substrate through graphene.
  • 专利号:   CN113104809-A
  • 发明人:   JIA R, XU S, LIU H, QIAO M, LIU G
  • 专利权人:   UNIV DEZHOU
  • 国际专利分类:   B81C001/00, B82Y040/00, G03F007/00
  • 专利详细信息:   CN113104809-A 13 Jul 2021 B81C-001/00 202170 Pages: 15 Chinese
  • 申请详细信息:   CN113104809-A CN10377003 08 Apr 2021
  • 优先权号:   CN10377003

▎ 摘  要

NOVELTY - Preparation of graphene nano mesh (GNM) involves using a patterned substrate to imprint a substrate/graphene, and penetrating the convex pattern of the patterned substrate through graphene. USE - Preparation of graphene nano mesh. ADVANTAGE - The method rapidly provides large-area, uniform, low-cost, high-porosity and low-defect graphene nano mesh in various patterns and sizes, and is suitable for preparation of other two-dimensional materials other than graphene such as molybdenum disulfide and boron nitride.