▎ 摘　　要

NOVELTY - Graphene transfer method involves adhering prepared graphene sample on copper foil base with tape on cover glass, spin coating polyvinyl alcohol solution, heating in vacuum, naturally cooling, spin coating poly(methyl methacrylate) solution, removing the tape after finishing, removing cover glass, obtaining graphene composite layer on a copper substrate, performing oxygen plasma etching, removing the graphene fragments on the back of the copper substrate, etching in a potassium persulfate solution, removing the copper substrate, adding into deionized water for cleaning, using a silicon wafer to take out the obtained double-substrate graphene, placing in a Petri dish, placing into the vacuum device to vacuum, heating, softening, making the graphene and the silicon wafer fit better, cooling, adding acetone and isopropanol to remove the poly(methyl methacrylate) substrate, removing polyvinyl alcohol, rinsing with deionized water, and blow drying. USE - Graphene transfer method. ADVANTAGE - The method reduces defects such as fragments, wrinkles, cracks and residual glue of the graphene after transfer, removes metal particles on the target substrate to the greatest extent, enhances hydrophilicity, and improves the transfer quality of graphene. DETAILED DESCRIPTION - Graphene transfer method involves (1) adhering prepared graphene sample on copper foil base with tape on cover glass, (2) placing the copper foil graphene sample in step (1) on spin coater, adding polyvinyl alcohol solution in drops, (3) heating the copper foil graphene sample spin-coated with polyvinyl alcohol solution in step (2) in a vacuum, naturally cooling, (4) placing the sample cooled in step (3) on the spin coater, adding poly(methyl methacrylate) solution in drops, removing the tape after finishing, removing cover glass, obtaining graphene composite layer on a copper substrate, (5) performing oxygen plasma etching on the copper base graphene composite layer in step (4), removing the graphene fragments on the back of the copper substrate, (6) etching the copper-based graphene composite layer from which the graphene fragments on the back are removed in step (5) in a potassium persulfate solution, removing the copper substrate, (7) adding the poly(methyl methacrylate)/polyvinyl alcohol dual-base graphene in step (6) into deionized water for cleaning, (8) using a silicon wafer to take out the double-substrate graphene obtained in step (7), placing in a petri dish, placing into the vacuum device to vacuum, (9) taking out the sample obtained in step (8) and placing in a glass petri dish for heating, softening the poly(methyl methacrylate)/polyvinyl alcohol layer, making the graphene and the silicon wafer fit better, (10) cooling the petri dish in step (9), adding acetone and isopropanol to the petri dish to remove the poly(methyl methacrylate) substrate, rinsing with deionized water, (11) placing the sample obtained in step (10) in 95 degrees C deionized water to react, removing polyvinyl alcohol, rinsing with deionized water, and blow drying.