• 专利标题:   Etching graphene nanostructure involves providing a piece of highly oriented pyrolytic graphite which includes first window, second window, and third window, where first window and second window includes one or more electrode contacts.
  • 专利号:   US2018370804-A1
  • 发明人:   DARLING M J
  • 专利权人:   NU PROMETHEAN TECHNOLOGIES INC
  • 国际专利分类:   C01B032/194, C25F003/00, B82Y040/00, C25F003/02, C25F003/14, B82Y030/00
  • 专利详细信息:   US2018370804-A1 27 Dec 2018 C01B-032/194 201902 Pages: 14 English
  • 申请详细信息:   US2018370804-A1 US989826 25 May 2018
  • 优先权号:   US588556P, US989826

▎ 摘  要

NOVELTY - Etching graphene nanostructure involves providing a piece of highly oriented pyrolytic graphite which includes a first window, a second window, and a third window, where first window and second window includes one or more electrode contacts configured to received an electrical voltage, where portion of third window includes a reaction area is configured to received a deoxyribonucleic acid sample, depositing deoxyribonucleic acid sample on piece of highly oriented pyrolytic graphite, where deoxyribonucleic acid sample comprises double-stranded deoxyribonucleic acid or single-stranded deoxyribonucleic acid, placing piece of highly oriented pyrolytic graphite in a humidity controlled chamber, applying a relative humidity to piece of highly oriented pyrolytic graphite, and applying electrical voltage across first window and second window, and etching a surface of highly oriented pyrolytic graphite. USE - Method for etching graphene nanostructure.