▎ 摘　　要

NOVELTY - The processing apparatus has a stage (101) in which a substrate (151) with which graphene is formed is mounted. A laser irradiation unit irradiates a pulse laser to the desired process location of the graphene. A reflectance measurement light source (113) irradiates light to process location of the graphene for reflectance measurement. A reflectance measurement unit (114) measures reflectance of light in process location of the graphene by reflectance measurement light source. USE - Processing apparatus for forming pattern of graphene thin film. ADVANTAGE - The laser processing of graphene is performed efficiently on optimal conditions, without applying effort rapidly. DETAILED DESCRIPTION - A control unit (131) changes conditions of laser irradiated to process location by comparison of reflectance measured by reflectance measurement unit with set objective value. A liquid supply portion (121) makes process location of graphene in state covered with water. A deaeration unit deaerates water. A gas supply section (123) supplies gas made into atmosphere of gas which makes process location of graphene to desired process location. DESCRIPTION OF DRAWING(S) - The drawing shows a block diagram of the processing apparatus. (Drawing includes non-English language text) Stage (101) Reflectance measurement light source (113) Reflectance measurement unit (114) Liquid supply portion (121) Gas supply section (123) Control unit (131) Substrate (151)