• 专利标题:   Silicon-based nanosheet produced by acid-treating metal-layered silicon-based compound to prepare proton-layered silicon-based compound, and exfoliating, useful in composite sheet for electronic devices, and supercapacitor.
  • 专利号:   KR2023081666-A
  • 发明人:   KIM S, SEUNGBO K, JUNG H J
  • 专利权人:   KOREA ADVANCED SCI TECHNOLOGY INST
  • 国际专利分类:   B01J039/02, B01J047/00, C01B033/06
  • 专利详细信息:   KR2023081666-A 07 Jun 2023 C01B-033/06 202354 Pages: 21
  • 申请详细信息:   KR2023081666-A KR162250 29 Nov 2022
  • 优先权号:   KR169121

▎ 摘  要

NOVELTY - Silicon-based nanosheet having an energy band gap of 2.35-2.95 eV and a specific resistance of 104Ω x cm to 106Ω x cm. USE - The silicon-based nanosheet is useful in silicon-based material and composite sheet (all claimed) for electronic devices, and supercapacitors. ADVANTAGE - The silicon-based nanosheet has excellent electrical, mechanical and electrochemical properties and broadens the application area of silicon-based devices that are applied to various fields e.g. cathode materials for secondary batteries. DETAILED DESCRIPTION - INDEPENDENT CLAIM is also included for: producing the silicon-based nanosheet, comprising (i) preparing a metal-layered silicon-based compound in which metal particles are positioned between layers of the layered silicon-based compound by reacting the layered silicon-based compound with a metal salt, (ii) acid-treating the metal-layered silicon-based compound to prepare a proton-layered silicon-based compound in which protons are located between layers, and (iii) exfoliating the layered silicon compound by reacting the proton-layered silicon compound with an alkylammonium salt or an alkylamine; ilicon-based material prepared from the silicon-based nanosheet; and composite sheet comprising silicon-based nanosheets and graphene-based nanosheets,