• 专利标题:   Chemical vapor deposition technique of high molecular nanocomposite preparation by preparing loaded nickel copper foil by depositing nickel and heat treating, depositing, and removing removed graphene material from organics and heavy metals.
  • 专利号:   CN110775965-A
  • 发明人:   TAN L, TAN J, TAN X
  • 专利权人:   JIANGSU LONGHUI NANOTECHNOLOGY CO LTD
  • 国际专利分类:   C01B032/186, C01B032/194, C01G023/047
  • 专利详细信息:   CN110775965-A 11 Feb 2020 C01B-032/186 202020 Pages: 8 Chinese
  • 申请详细信息:   CN110775965-A CN11216324 02 Dec 2019
  • 优先权号:   CN11216324

▎ 摘  要

NOVELTY - Chemical vapor deposition technique of high molecular nanocomposite preparation involves preparing loaded nickel copper foil comprising depositing nickel and heat treating at 865-875 degrees C for 5-8 minutes, naturally cooling to normal temperature, using argon gas and hydrogen mixed gas as protective gas, depositing under certain temperature condition, cooling at rate of 10 K/second, removing deposited graphene when substrate is cooled to 200 degrees C, removing removed graphene material from organics and heavy metals, and preparing graphene-nano inorganic composites. USE - The method is used for chemical vapor depositing high molecular nanocomposite preparation.