▎ 摘　　要

NOVELTY - The method involves selecting graphene powder with specific surface absorbing distribution density as processing base material of ceramic substrate and vacuumizing until the vacuum degree is more than specific value. The inert gas or mixed gas of reaction gas or both is provided as carrier gas. A thin film is deposited in graphene powder material absorbed surface of the ceramic substrate at specific vacuum degree and at specific vacuum working environment. The deposition temperature is 25 to 125 degrees C. The deposition time is 120 to 5000 seconds. USE - Manufacturing method of ceramic substrate for LED. ADVANTAGE - The heat conductivity and insulation are improved. DESCRIPTION OF DRAWING(S) - The drawing shows a schematic view of the ceramic substrate manufacturing device. Magnetron sputtering target (4) Worktable (5) Vacuum pumping unit (6) Working gas (7) Substrate (8)