▎ 摘　　要

NOVELTY - An large-area graphene thin film (40) is manufactured by irradiating an energy beam after forming a graphene precursor film (30) on a substrate (10), and forming a catalyst layer (20) before or after the formation of the graphene precursor film. USE - Manufacture of large-area graphene thin film. ADVANTAGE - The method can easily control the material and thickness of the film according to the composition, viscosity, coating method, and coating thickness of the graphene precursor solution, so it is easy to control the properties and thickness of the finally obtained graphene thin film, and high quality with less defects thin film can be produced. DETAILED DESCRIPTION - An INDEPENDENT CLAIM is included for manufacturing a fin thin film which involves performing energy beam irradiation by arranging the energy beam sources in series and/or parallel on the substrate (10), and transferring the substrate or energy beam source in one direction to irradiate the entire substrate. DESCRIPTION OF DRAWING(S) - The drawing shows a flowchart of the manufacturing process of graphene thin film. Substrate (10) Catalyst layer (20) Graphene precursor film (30) Graphene thin film (40)