▎ 摘　　要

NOVELTY - Rapid preparation of graphene patterns using double beams comprises simultaneously focusing continuous laser beam and short pulse laser on nickel substrate surface, heating to graphene growth temperature, contacting with methane gas, maintaining laser beam and nickel substrate relative movement, reducing focused region by thermal diffusion and thermal convection, precipitating dissolved carbon, and forming graphene pattern. USE - Method for rapidly preparing graphene patterns using double beams. ADVANTAGE - The product has improved edge quality. DETAILED DESCRIPTION - An INDEPENDENT CLAIM is included for the graphene pattern preparation device comprising pulse laser unit (1), continuous laser unit (2), dichroic mirror (3), beam shaping and focusing unit (4), vacuum cavity (5), gas flow rate control unit (6), and three-axis precision translation stage (7). DESCRIPTION OF DRAWING(S) - The drawing shows a schematic diagram of graphene pattern preparation device. Pulse laser unit (1) Continuous laser unit (2) Dichroic mirror (3) Beam shaping and focusing unit (4) Vacuum cavity (5) Gas flow rate control unit (6) Three-axis precision translation stage (7)