• 专利标题:   Rapid preparation of graphene patterns using double beams involves simultaneously focusing continuous laser beam and short pulse laser on nickel substrate surface, heating to graphene growth temperature, and contacting with methane gas.
  • 专利号:   CN106868471-A, CN106868471-B
  • 发明人:   ZHANG C, ZHANG J, LIN K, HUANG Y
  • 专利权人:   UNIV XIAMEN, UNIV XIAMEN
  • 国际专利分类:   C23C016/04, C23C016/26, C23C016/48
  • 专利详细信息:   CN106868471-A 20 Jun 2017 C23C-016/04 201750 Pages: 9 Chinese
  • 申请详细信息:   CN106868471-A CN10159903 17 Mar 2017
  • 优先权号:   CN10159903

▎ 摘  要

NOVELTY - Rapid preparation of graphene patterns using double beams comprises simultaneously focusing continuous laser beam and short pulse laser on nickel substrate surface, heating to graphene growth temperature, contacting with methane gas, maintaining laser beam and nickel substrate relative movement, reducing focused region by thermal diffusion and thermal convection, precipitating dissolved carbon, and forming graphene pattern. USE - Method for rapidly preparing graphene patterns using double beams. ADVANTAGE - The product has improved edge quality. DETAILED DESCRIPTION - An INDEPENDENT CLAIM is included for the graphene pattern preparation device comprising pulse laser unit (1), continuous laser unit (2), dichroic mirror (3), beam shaping and focusing unit (4), vacuum cavity (5), gas flow rate control unit (6), and three-axis precision translation stage (7). DESCRIPTION OF DRAWING(S) - The drawing shows a schematic diagram of graphene pattern preparation device. Pulse laser unit (1) Continuous laser unit (2) Dichroic mirror (3) Beam shaping and focusing unit (4) Vacuum cavity (5) Gas flow rate control unit (6) Three-axis precision translation stage (7)