▎ 摘　　要

NOVELTY - Manufacture of graphene film involves arranging (S10) substrate in reaction chamber including inlet and outlet, providing (S20) metallic catalytic material in the reaction chamber, providing (S30) reducing gas into the reaction chamber, raising (S40) the temperature of the reaction chamber to deposition temperature, providing (S50) carbon-containing gas into the reaction chamber, and generating carbon atoms (S60) from the carbon-containing gas in the assistance of the metallic catalytic material and the atoms deposited on the substrate. USE - Manufacture of graphene film. Uses include but are not limited to semiconductor, touch panel, solar cell and transparent electrode for field effect transistors. ADVANTAGE - The method enables manufacture of high-quality graphene film having large area with high flexibility and low reflectance. DESCRIPTION OF DRAWING(S) - The drawing shows a flowchart of graphene film. Arrangement process (S10) Provision of metallic catalytic material (S20) Providian of reducing gas (S30) Temperature raise process (S40) Provision of carbon-containing gas (S50) Generation process (S60)