• 专利标题:   Saturable absorber device for adjusting saturation threshold comprises optical waveguide and saturable absorber structure in which more than one-unit structures are arranged at predetermined intervals on one side of optical waveguide.
  • 专利号:   KR2023071742-A
  • 发明人:   HEO D C, BAE Y M, SEOL S K, PYO J Y
  • 专利权人:   KOREA ELECTRO TECHNOLOGY RES INST
  • 国际专利分类:   B82Y040/00, C01B032/158, C01B032/182, H01S003/067, H01S003/11
  • 专利详细信息:   KR2023071742-A 23 May 2023 H01S-003/11 202349 Pages: 14
  • 申请详细信息:   KR2023071742-A KR151186 14 Nov 2022
  • 优先权号:   KR157837

▎ 摘  要

NOVELTY - Saturable absorber device (100) comprises optical waveguide (110) and saturable absorber structure (120) in which more than one-unit structures are arranged at predetermined intervals on one side of the optical waveguide, where a saturation threshold is adjusted according to the number of unit structures in the saturable absorber structure. The unit structure comprises carbon nanotubes (CNT) or graphene. USE - The saturable absorber device is useful for adjusting saturation threshold (claimed). ADVANTAGE - The device is inserted inside various lasers to induce passive mode-locking through which picosecond or femtosecond of passive devices to generate ultrashort pulses of the second level, minimizes thermal damage caused by using evanescent field. The method manufactures saturable absorber while controlling characteristic change occurring during manufacturing process of CNTs or graphene, and controls reproducibility of saturable absorber by degree of distribution of evanescent field in CNT or graphene-based saturable absorber and deviation according to properties of CNT and graphene saturable absorber material. DETAILED DESCRIPTION - An INDEPENDENT CLAIM is also included for manufacturing saturable absorber. DESCRIPTION OF DRAWING(S) - The drawing shows a block diagram of a saturable absorber device (Drawing includes non-English language text). 100Saturable absorber 110Optical waveguide 120Saturable absorber structure