▎ 摘　　要

NOVELTY - The method involves cleaning a non-metallic substrate surface and blown dry with nitrogen. A thickness of a thin metal layer substrate is 1-10nm. The thin metal layer substrate is located on a CVD reaction chamber. USE - Non-metallic substrate graphene growing method. ADVANTAGE - The method enables simplifying cleaning process and avoiding potential problem in a better manner. DESCRIPTION OF DRAWING(S) - The drawing shows a flow diagram illustrating a non-metallic substrate graphene growing method. '(Drawing includes non-English language text)'