▎ 摘　　要

NOVELTY - Photoresist material comprises phenolic resin and graphene nanosheets. The graphene nanosheets have two-dimensional network structure. The graphene nanosheets are uniformly dispersed in the phenolic resin. The phenolic resin forms a three-dimensional network-shaped structure. USE - Used as photoresist material. ADVANTAGE - The material: utilizes graphene nanocrystals as black pigment; uniformly disperses ultra-thin reticulated graphene nanocrystals in resin matrix; is not easy to agglomerate, excellent to formation of three-dimensional reticular structure of resin; and enhances crosslinking degree of the resin. DETAILED DESCRIPTION - INDEPENDENT CLAIMS are also included for: (1) a display panel, comprising a substrate, and photoresist material provided on the substrate; and (2) preparation the display panel, comprising providing substrate, coating the photoresist material, and exposing the photoresist material. DESCRIPTION OF DRAWING(S) - The drawing shows a schematic representation of the photoresist material.