▎ 摘　　要

NOVELTY - Improving graphene deposition involves exposing a substrate surface to an oxygenating plasma to improve substrate surface quality or deposition parameter. The oxygenating plasma comprises oxygen or water. The oxygenating plasma is a microwave plasma, a remote plasma, a conductively coupled plasma or an inductively coupled plasma. The substrate surface is exposed to the oxygenating plasma at a temperature less than or equal to about 800 degrees Celsius. The substrate surface quality is selected from increased smoothness, decreased hydrogen concentration or decreased contamination. The deposition parameter is selected from increased film thickness, decreased film resistance, or increased uniformity. USE - Method for improving graphene deposition. ADVANTAGE - The method enables improving graphene deposition at lower temperatures, and providing graphene layers with lower resistance, graphene layers in a relatively short period of time.