▎ 摘　　要

NOVELTY - Pellicle (100) comprises a central layer (110) formed on a pellicle frame, and capping layers (130) formed outside the central layer, where at least some of the capping layers have a different radiation spectrum than the rest. USE - Pellicle for extreme ultraviolet lithography. ADVANTAGE - The pellicle has improved thermal stability, and minimizes loss of optical properties. DESCRIPTION OF DRAWING(S) - The drawing shows a cross-sectional view of a pellicle. Pellicle (100) Central layer (110) Lower layer (111) Upper layer (112) Capping Layer (130)