• 专利标题:   Device for wet transferring graphene film, comprises e.g. target substrate stage which is set in water tank, and is parallel to bottom of water tank, and target substrate set on upper surface of target substrate stage.
  • 专利号:   WO2021056807-A1, CN112551516-A
  • 发明人:   LU W, XIA Y, LI N, ZHAO L, LENG X, HE M, JIE X
  • 专利权人:   INST MICROELECTRONICS CHINESE ACAD SCI, INST MICROELECTRONICS CHINESE ACAD SCI
  • 国际专利分类:   C01B032/184, C01B032/194
  • 专利详细信息:   WO2021056807-A1 01 Apr 2021 C01B-032/184 202130 Pages: 23 Chinese
  • 申请详细信息:   WO2021056807-A1 WOCN121694 28 Nov 2019
  • 优先权号:   CN10912398

▎ 摘  要

NOVELTY - Device comprises a target substrate stage (2) which is set in a water tank (1), and is parallel to the bottom of the water tank. The target substrate stage and the bottom of the water tank have a predetermined distance, where the target substrate stage has a through hole. A target substrate (3) is set on the upper surface of the target substrate stage. A liquid inlet pipe (8) is set at the lower part of the side wall of the water tank, and is set below the target substrate stage, where the liquid inlet pipe is connected with the water tank through a first valve. A liquid outlet pipe (7) is below the liquid inflow pipe, and is connected with the water tank through a second valve, where the first valve is set on the liquid inflow pipe and the second valve is set on the liquid outflow pipe. USE - The device is useful for wet transferring graphene film (claimed). ADVANTAGE - The device has effects of transferring a large area of graphene with a metal base, ensuring better contact between the graphene and the target substrate, reducing the fracturing of a graphene thin film during transferring, and improving the quality of transferring the graphene are achieved. DETAILED DESCRIPTION - An INDEPENDENT CLAIM is also included for method for wet transferring graphene film, comprising spin coating a layer of protective film on the graphene thin film grown on the metal substrate; punching the etching liquid from the liquid inflow pipe to the water tank until the liquid level of the etching liquid exceeds a certain distance of the target substrate; placing the metal substrate with the graphene film in the etching liquid in the water tank; completely etching the metal substrate; after the etching is finished, the etching liquid flows out from the liquid outlet pipe; attaching the protective film and the graphene film on the upper surface of the target substrate; filling the cleaning liquid into the water tank from the liquid inflow pipe, washing the protective film and the graphene film for multiple times, flowing out the cleaning liquid from the liquid outflow pipe, taking out the target substrate and heating and drying the target substrate for the first time; tightly adhering the graphene film on the target substrate; heating target substrate and drying, placing on the target substrate holder; filling acetone solution in the water tank from the liquid inflow pipe; dissolving the protective film, allowing acetone solution to flow out from the liquid outflow pipe; and taking out the target substrate and heating and drying the target substrate for the second time and finishing the transfer of the graphene film. DESCRIPTION OF DRAWING(S) - The drawing shows a schematic representation of the device for wet transferring graphene film. Water tank (1) Target substrate stage (2) Target substrate (3) Liquid outlet pipe (7) Liquid inlet pipe (8)