• 专利标题:   Preparing porous electromagnetic shielding device with low reflection and high absorption based on gradient structure design comprises utilizing three dimensional printing to prepare polymer matrix composites containing conductive fillers and magnetic particles.
  • 专利号:   CN113561473-A, CN113561473-B
  • 发明人:   ZENG S, ZHAO H, HE L
  • 专利权人:   QIJI SUZHOU PRECISION TECHNOLOGY CO LTD
  • 国际专利分类:   B29C064/106, B29C064/118, B33Y010/00, C08J009/12, C08J009/28, C08K003/04, C08K003/08, C08K003/22, C08K007/00, C08L001/02, C08L023/06, C08L029/04, C08L075/04, H05K009/00
  • 专利详细信息:   CN113561473-A 29 Oct 2021 B29C-064/106 202214 Chinese
  • 申请详细信息:   CN113561473-A CN10792481 13 Jul 2021
  • 优先权号:   CN10792481

▎ 摘  要

NOVELTY - Preparing porous electromagnetic shielding device with low reflection and high absorption based on gradient structure design comprises utilizing three dimensional printing to prepare polymer matrix composites containing conductive fillers and magnetic particles into parts with a specific three-dimensional gradient structure, using hole forming technology to make holes on the obtained parts to obtain porous electromagnetic shielding device with low reflection and high absorption based on gradient structure design. USE - The method is useful for preparing porous electromagnetic shielding device with low reflection and high absorption based on gradient structure design. ADVANTAGE - The method: realizes the controllable and high-precision gradient structure design of the porous electromagnetic shielding device in a macroscopic view; improves electromagnetic shielding performance and absorption coefficient; and broadens potential application fields of electromagnetic shielding parts. DETAILED DESCRIPTION - An INDEPENDENT CLAIM is also included for porous electromagnetic shielding device with low reflection and high absorption based on gradient structure design comprising printing filaments arranged three-dimensionally with a certain density. The thread arrangement is a pyramid arrangement. The specific structure is dense in the middle of the upper thread and sparse in the outside. The lower thread is dense in the middle and outside, where except for the voids between the overlapping points of the threads. A large number of pore structures arranged in the thread, whose porosity is greater than 50%.