• 专利标题:   Method for manufacturing graphene, involves forming a carbon containing layer on base layer by atomic-layer-deposition method, and amorphous carbon layer from carbon containing layer, and graphene from amorphous carbon layer.
  • 专利号:   WO2016067597-A1, JP2016088766-A, KR2017003670-A, JP6350220-B2, KR1909368-B1
  • 发明人:   KOJIMA E, KATAYAMA M, KANO K, OONISHI S, ONISHI S
  • 专利权人:   DENSO CORP, DENSO CORP
  • 国际专利分类:   C01B031/02, C01B031/04, C23C016/455, C01B032/184
  • 专利详细信息:   WO2016067597-A1 06 May 2016 C01B-031/02 201639 Pages: 20 Japanese
  • 申请详细信息:   WO2016067597-A1 WOJP005393 27 Oct 2015
  • 优先权号:   JP221380

▎ 摘  要

NOVELTY - The method involves forming a carbon containing layer on a base layer (1) by an atomic-layer-deposition method. The amorphous carbon layer is formed from the carbon containing layer. The graphene (11) is formed from the amorphous carbon layer. The temperature in a first heat treatment operation is 600 degrees C or less. The number of the aromatic rings contained in the monomer which comprises the polymer when the carbon containing layer contains a polymer is one or less. The self-organization unimolecular layer is formed between the base layer and the carbon containing layer. USE - Method for manufacturing graphene. ADVANTAGE - The graphene of a uniform film thickness is manufactured, as the amorphous carbon layer is formed from the carbon containing layer, and the graphene is formed from the amorphous carbon layer. DETAILED DESCRIPTION - The method involves bonding the functional group contained in the self-organization unimolecular layer and the functional group contained in the carbon containing layer. The self-organization unimolecular layer is formed in a vacuum for the formation of the self-organization unimolecular layer, and the carbon containing layer. The operations from carbon containing layer formation to the first heat treatment operation are continuously performed in a vacuum. The operations from first heat treatment operation to second heat treatment operation are continuously performed in a vacuum. DESCRIPTION OF DRAWING(S) - The drawing shows a sectional view illustrating the heat treatment method. Base layer (1) Sapphire substrate (3) Graphene (11)