▎ 摘　　要

NOVELTY - The method involves forming a graphene sheet on a substrate i.e. silicon/silicon dioxide substrate. A green light of wavelength 520 - 590nm is irradiated in the graphene sheet. An optical microscope image about the graphene sheet is obtained. Shading value is measured from the optical microscope image. A floor number of graphene included in the graphene sheet is determined. Channel image of the optical microscope image about the graphene sheet is obtained. A silicon dioxide layer is formed on the substrate. USE - Method for testing dimension of a graphene sheet of a semiconductor flat panel display. ADVANTAGE - The method enables determining the floor number of the graphene included in thickness of the graphene sheet by using the optical microscope image about the graphene sheet so that need of an expensive equipment can be avoided and thickness of rapid graphene can be determined in simple manner and high quality manner. DESCRIPTION OF DRAWING(S) - The drawing shows a flowchart illustrating a method for testing dimension of a graphene sheet of a semiconductor flat panel display. '(Drawing includes non-English language text)'