▎ 摘　　要

NOVELTY - Preparing graphene microstructure comprises spin coating SU-8 photoresist on the surface of the silicon chip by a spin coater, preparing the patterned SU-8 photoresist microstructure by using the photo-etching technique, and using electron beam irradiation technique to irradiate the pattern-patternedSU-8 photocatalyst microstructure to obtain the graphene microstructure. USE - Method for preparing graphene of microstructure. ADVANTAGE - The preparation graphene of the microstructure adopts the combination of the photo-etching technique and the electron beam irradiation technique, the preparation method is simple and easy, it not only avoids the pollution to the graphene in the transfer process, but also solves the problem of complex transfer process and long time consumption to effectively improve the production graphene of microstructure. DETAILED DESCRIPTION - An INDEPENDENT CLAIM is included for the preparation method of the graphene micro-structure.