• 专利标题:   Method for preparing patterned graphene, involves attaching flexible film as supporting layer to surface of photoresist, and pasting sample after removing copper foil on substrate with graphene side, and removing flexible film and photoresist layer.
  • 专利号:   CN113526498-A
  • 发明人:   XU Z, WANG H, LIU J
  • 专利权人:   SONGSHAN LAKE MATERIALS LAB
  • 国际专利分类:   C01B032/194, G01N027/327
  • 专利详细信息:   CN113526498-A 22 Oct 2021 C01B-032/194 202225 Chinese
  • 申请详细信息:   CN113526498-A CN10638584 08 Jun 2021
  • 优先权号:   CN10638584

▎ 摘  要

NOVELTY - The method involves coating the photoresist on the side of the copper foil in which the graphene is grown, and completing the patterning of the photoresist after curing and forming. The graphene is etched according to the patterned photoresist to complete the patterning of the graphene. A flexible film is attached as a supporting layer to the surface of the photoresist, and the sample in an etching solution is placed to etch and remove the copper foil. The sample after removing the copper foil is pasted on the substrate with the graphene side, and the flexible film and the photoresist layer are removed. USE - Method for preparing patterned graphene. ADVANTAGE - The graphene transferred has no wrinkles or damage. The invention also provides a method for manufacturing the biosensor. The transfer efficiency and lithography success rate are improved. The transferred graphene does not appear wrinkled or damaged. DETAILED DESCRIPTION - An INDEPENDENT CLAIM is included for a method for manufacturing a biosensor. DESCRIPTION OF DRAWING(S) - The drawing shows a schematic view of the method for preparing patterned graphene.