• 专利标题:   Chemical mechanical polishing solution comprises metal corrosion inhibitor, accelerator including carbon fiber powder, graphene powder and bioflavonoid, oxidizing agent, nonionic surfactant, complexing agent and ionized water.
  • 专利号:   CN115895454-A
  • 发明人:   XU F, LONG J, ZHOU Q, LIANG K
  • 专利权人:   TIANJIN PASSION ADVANCED MATERIAL TECHNO
  • 国际专利分类:   C09G001/02, C23F003/04
  • 专利详细信息:   CN115895454-A 04 Apr 2023 C09G-001/02 202337 Chinese
  • 申请详细信息:   CN115895454-A CN11464486 22 Nov 2022
  • 优先权号:   CN11464486

▎ 摘  要

NOVELTY - Chemical mechanical polishing solution comprises metal corrosion inhibitor, accelerator, oxidizing agent, nonionic surfactant, complexing agent and ionized water, where the accelerator includes carbon fiber powder, graphene powder and bioflavonoid. USE - Used as chemical mechanical polishing solution. ADVANTAGE - The polishing rate is improves by the carbon fiber powder in accelerator, the chemical mechanical polishing solution is reduces graphene powder and bioflavonoids in accelerator, the components of the polishing solution has better coordinated, polishing rate is greatly increased, and the mechanical polishing solution is more safe to use, has better use effect.