• 专利标题:   Manufacture of optionally substituted aryl group-substituted polycyclic aromatic compound used for manufacturing graphene, involves reacting polycyclic aromatic compound and boron compound substituted by optionally substituted aryl group.
  • 专利号:   WO2012169635-A1, CN103649024-A, EP2730554-A1, US2014206908-A1, JP2013519551-X, US9056822-B2, IN201400199-P1, CN103649024-B, JP5988051-B2, EP2730554-A4
  • 发明人:   ITAMI K, MOCHIDA K, KAWASUMI K, SEGAWA Y, KAJINO T
  • 专利权人:   UNIV NAGOYA NAT CORP, UNIV UNIV NAGOYA NAT CORP, UNIV NAGOYA NAT CORP, UNIV NAGOYA NAT CORP, UNIV NAGOYA NAT CORP, UNIV NAGOYA, UNIV NAGOYA
  • 国际专利分类:   C07B061/00, C07C015/20, C07C015/30, C07C015/38, C07C017/263, C07C002/86, C07C022/08, C07C025/22, C07C005/44, C07C017/361, C07C041/30, C07C002/66, C07C043/21
  • 专利详细信息:   WO2012169635-A1 13 Dec 2012 C07C-002/86 201304 Pages: 169 Japanese
  • 申请详细信息:   WO2012169635-A1 WOJP064845 08 Jun 2012
  • 优先权号:   JP130547

▎ 摘  要

NOVELTY - A polycyclic aromatic compound and a boron compound substituted by optionally substituted aryl group are reacted in presence of a palladium compound and o-chloranil, to obtain optionally substituted aryl group-substituted polycyclic aromatic compound. USE - Manufacture of aryl group-optionally substituted polycyclic aromatic compound used for manufacturing graphene. ADVANTAGE - The aryl group-optionally substituted polycyclic aromatic compound is manufactured, by simple method. The desired position of carbon-hydrogen bond of polycyclic aromatic compound is directly arylated by carrying out carbon-hydrogen/carbon-boron coupling using palladium compound, o-chloranil and boron compound. DETAILED DESCRIPTION - INDEPENDENT CLAIMS are included for the following: (1) manufacture of tridecaene-containing compound of formula (C"), which involves reacting phenanthrene-containing compound of formula (B') and boron-containing compound of formula (G) in presence of palladium compound and o-chloranil, to obtain biphenyl-containing compound of formula (D') and subjecting biphenyl-containing compound (D') to cyclocondensation reaction; (2) manufacture of perylene-containing compound of formula (C'), which involves reacting naphthalene-containing compound of formula (B") and compound having naphthalene structure in presence of palladium compound and o-chloranil to obtain binaphthalene-containing compound of formula (D") and subjecting binaphthalene-containing compound (D") to cyclocondensation reaction; (3) pyrene-containing compound of formula (F1a); (4) pyrene-containing compound of formula (F1b); (5) phenanthrene-containing compound of formula (F2); (6) heptacyclo(16.12.0.02,11.04,9.012,17.019,24.025,30)triaconta-1(18),2(11),3,5,7,9,12(17),13,15,19(24),20,22,25(30),26,28-pentadecaene; (7) pyrene-containing compound of formula (F3); (8) cyclopentene-containing of formula (F4); and (9) perylene-containing compound of formula (F5). R8a,R8b=aromatic group substituted by 1-3 substituents chosen from 1-20C alkyl, halo and fluoro (excluding phenyl); m1,m2=0-2; m1+m2=1-4; R5,R7=H or 1-20C alkyl, where at least one of R5 and R7 is alkyl; R5a,R7a=H or 1-20C alkyl; R9=H, halo, 1-20C alkyl optionally substituted by fluoro, or aromatic group having ring number of 1 or 2; R50,R70=H or 1-20C alkyl; R10=aromatic group substituted by 1-3 substituents chosen from 1-20C alkyl group, halo and fluoro, or H, where number of H of two R10 is 0 or 1; or two R10=ring;and R11=aromatic group substituted by 1-3 substituents chosen from 1-20C alkyl group, halo and fluoro and having ring number of 1 or 2.