• 专利标题:   LED-based epitaxial wafer for chip of LED device, comprises graphene sapphire substrate, aluminum nitride, u-gallium nitride, n-gallium nitride, multiple quantum well and p-gallium nitride thin film.
  • 专利号:   CN108010995-A
  • 发明人:   LIU Z, CHEN Z, GANG P
  • 专利权人:   UNIV PEKING
  • 国际专利分类:   H01L033/00, H01L033/02, H01L033/12
  • 专利详细信息:   CN108010995-A 08 May 2018 H01L-033/02 201846 Pages: 13 Chinese
  • 申请详细信息:   CN108010995-A CN11247017 01 Dec 2017
  • 优先权号:   CN11247017

▎ 摘  要

NOVELTY - A LED-based epitaxial wafer comprises graphene sapphire substrate, aluminum nitride, u-gallium nitride, n-gallium nitride, multiple quantum well and p-gallium nitride thin film in order from bottom to top. USE - LED-based epitaxial wafer for chip of LED device (all claimed). ADVANTAGE - The LED-based epitaxial wafer has excellent thermal conductivity, uses gallium nitride film which has reduced stress and dislocation density, and provides LED chip having high power and excellent luminous efficiency of 20-50%. DETAILED DESCRIPTION - An INDEPENDENT CLAIM is included for preparation of the LED-based epitaxial wafer, which involves growing an aluminum nitride, u-gallium nitride, n-gallium nitride, multiple quantum well and p-gallium nitride thin film on graphene sapphire substrate.