• 专利标题:   Forming graphene-based structure on textile substrate, involves providing layers of graphene oxide on textile substrate, and directing laser beam onto layers of graphene oxide form respective porous layers of reduced graphene oxide.
  • 专利号:   WO2020237296-A1
  • 发明人:   VARGHESE THEKKEKARA L, GU M
  • 专利权人:   ROYAL MELBOURNE INST TECHNOLOGY LTD
  • 国际专利分类:   B29C067/00, C01B032/00, C08J003/00, C09D011/30, H01B001/24, H01G011/00
  • 专利详细信息:   WO2020237296-A1 03 Dec 2020 H01B-001/24 202099 Pages: 31 English
  • 申请详细信息:   WO2020237296-A1 WOAU050518 25 May 2020
  • 优先权号:   AU901790

▎ 摘  要

NOVELTY - Forming a graphene-based structure on a textile substrate (210), comprises: providing at least one layers of graphene oxide (220) on the textile substrate; and, directing a laser beam onto the layers of graphene oxide to reduce at least a portion of the graphene oxide and form at least one respective porous layers of reduced graphene oxide (230). USE - The method is useful: for forming a graphene-based structure on a textile substrate; and in a functional textile, which is used in a wearable article (all claimed), preferably clothing incorporating sensing and/or energy storage means (e.g. supercapacitor devices). ADVANTAGE - The method: is single step lithographic fabrication technique, applicable for structures on a variety of scales; provides a surprising departure from conventional approaches; and provides large-scale production of the graphene-based, textile-based structure. DETAILED DESCRIPTION - An INDEPENDENT CLAIM is also included for a textile-based and graphene-based structure (200) including a textile substrate and porous layers of reduced graphene oxide having substantially uniform porosity. DESCRIPTION OF DRAWING(S) - The figure shows a schematic view of a graphene-based and textile-based structure. Graphene-based and textile-based structure (200) Substrate (210) Graphene oxide (220) Reduced graphene oxide (230)