▎ 摘　　要

NOVELTY - The device has main portion which is provided with vacuum cavity (104), target material (105), and substrate (106). The vacuum cavity is grounded. The target material is connected with negative power supply. The substrate is connected with positive power supply. An anode device is arranged between the target material and substrate. The neutral atoms are passed through the anode device. The potential of anode device is greater than or equal to the potential of substrate. The argon gas is dispersed in vacuum cavity. USE - Sputter coating device for forming transparent conductive thin film on graphene film. ADVANTAGE - The transparent conductive thin film can be formed on graphene film easily, without damaging graphene film layer. The coating operation can be performed uniformly. The resistivity of transparent conductive film can be reduced. The cost of device can be reduced. The performance efficiency of device can be improved. DETAILED DESCRIPTION - An INDEPENDENT CLAIM is included for a method for generating transparent conductive film on graphene film. DESCRIPTION OF DRAWING(S) - The drawing shows a schematic view of the sputter coating device. Vacuum cavity (104) Target material (105) Substrate (106) Target voltages (U1-U3)