• 专利标题:   Method for preparing graphene/gallium arsenide (GaAs) solar battery, involves etching heavily doped gallium GaAs layer between front electrode grid lines to and preparing anti-reflective layer on surface of exposed graphene layer.
  • 专利号:   CN106449791-A, CN106449791-B
  • 发明人:   JIA R, GUI Y, SUN H, TAO K, DAI X, JIN Z, LIU X
  • 专利权人:   INST MICROELECTRONICS CHINESE ACAD SCI
  • 国际专利分类:   H01L031/0216, H01L031/0224, H01L031/0304, H01L031/18
  • 专利详细信息:   CN106449791-A 22 Feb 2017 H01L-031/0216 201719 Pages: 11 Chinese
  • 申请详细信息:   CN106449791-A CN11129480 09 Dec 2016
  • 优先权号:   CN11129480

▎ 摘  要

NOVELTY - The method involves transferring graphene to surface of window layer of GaAs epitaxial wafer to form a graphene layer. A heavily doped GaAs cap layer is prepared on the surface of the graphene layer. A back electrode is prepared on the surface of GaAs epitaxial wafer substrate and a front electrode is prepared on the surface of the cap layer. The cap layer is etched between front electrode grid lines by chemical etching method to expose the graphene layer and a anti-reflective layer is prepared on the surface of the exposed graphene layer. USE - Method for preparing graphene/gallium arsenide solar battery. ADVANTAGE - The lateral transport of photogenerated carriers is promoted and composite center of photogenerated current is reduced. The series resistance is reduced and filling factor is improved. The photoelectric conversion efficiency of solar battery is improved. DESCRIPTION OF DRAWING(S) - The drawing shows a flowchart illustrating the method for preparing graphene/gallium arsenide solar battery. (Drawing includes non-English language text)