• 专利标题:   Composition useful for catalyst-free electroless plating, comprises metal precursors including nickel precursor, and iron precursors, cobalt precursors and/or copper precursors, reducing agent, and plated object.
  • 专利号:   KR2198242-B1
  • 发明人:   KIM T, LEE K B, LEE S B, JUNG B M
  • 专利权人:   KOREA MATERIAL SCI INST
  • 国际专利分类:   C23C018/16, C23C018/48, C23C018/50
  • 专利详细信息:   KR2198242-B1 06 Jan 2021 C23C-018/16 202108 Pages: 21
  • 申请详细信息:   KR2198242-B1 KR152562 30 Nov 2018
  • 优先权号:   KR019793, KR152562

▎ 摘  要

NOVELTY - Composition comprises 0.0001-0.0054 M metal precursors including nickel precursor, and at least one of iron precursors, cobalt precursors and copper precursors; reducing agent; and plated object. USE - The composition is useful for catalyst-free electroless plating (claimed). ADVANTAGE - The composition does not require catalyst i.e. noble metal catalyst, and is economical. DESCRIPTION OF DRAWING(S) - The drawing shows a schematic representation of the catalyst-free electroless plating method. Catalyst-free electroless plating (10) Graphene dispersion (20) Graphene (30)