• 专利标题:   Preparing graphene porous thin film based on template method comprises e.g. using natural crystalline flake graphite, using improved Hummers method for preparing graphite oxide, preparing graphene solution, and filtering by adding template.
  • 专利号:   CN103787324-A, CN103787324-B
  • 发明人:   YANG H, PAN Q, WANG H, ZHAO J, XING B, WANG L
  • 专利权人:   UNIV SHANXI DATONG
  • 国际专利分类:   C01B031/04
  • 专利详细信息:   CN103787324-A 14 May 2014 C01B-031/04 201446 Pages: 6 Chinese
  • 申请详细信息:   CN103787324-A CN10057112 20 Feb 2014
  • 优先权号:   CN10057112

▎ 摘  要

NOVELTY - Preparing graphene porous thin film based on template method comprises (i) using natural crystalline flake graphite as raw material, using improved Hummers method for preparing graphite oxide, carrying out ultrasonic treatment to obtain graphene oxide solution, and reducing by hydrazine hydrate to obtain graphene solution; (ii) filtering graphene solution by adding template to obtain black thin film, and drying; and (iii) placing the thin film into a sealed quartz vessel, placing in a high temperature furnace under vacuum status, quickly taking out, reacting, and cooling to room temperature. USE - The method is useful for preparing graphene porous thin film based on template method (claimed). ADVANTAGE - The porous thin film: can produce graphene porous thin films with different apertures; has strong operability and low cost; and is suitable for industrial production. DETAILED DESCRIPTION - Preparing graphene porous thin film based on template method comprises (i) using 50-8000 meshes natural crystalline flake graphite as raw material, using improved Hummers method for preparing graphite oxide, carrying out ultrasonic treatment for 1-24 hours to obtain graphene oxide solution, and then reducing by hydrazine hydrate to obtain graphene solution; (ii) filtering 10-200 ml graphene solution by adding 0.05-1 mg/ml template to obtain black thin film, and drying the thin film at 40-110 degrees C for 12 hours under vacuum condition; and (iii) placing the thin film into a sealed quartz vessel, placing in a high temperature furnace at 600-1100 degrees C under vacuum status, quickly taking out, reacting for 1-60 minutes, and cooling to room temperature under vacuum state.