• 专利标题:   Formation of metallic foil on graphene during manufacture of electronic component, involves plasma-treating graphene under inert gas atmosphere or non-oxidizing atmosphere, and depositing metal.
  • 专利号:   KR2013035617-A
  • 发明人:   CHOI M S, LEE S H, YOO W J
  • 专利权人:   SAMSUNG ELECTRONICS CO LTD, UNIV SUNGKYUNKWAN RES BUSINESS FOUND
  • 国际专利分类:   C23C014/02, C23C014/04, C23C014/14, C23C014/18
  • 专利详细信息:   KR2013035617-A 09 Apr 2013 C23C-014/02 201379 Pages: 13
  • 申请详细信息:   KR2013035617-A KR100030 30 Sep 2011
  • 优先权号:   KR100030

▎ 摘  要

NOVELTY - Graphene is plasma-treated under inert gas atmosphere or non-oxidizing atmosphere, and metal is deposited on the plasma-treated graphene. USE - Formation of metallic foil on graphene during manufacture of electronic component (all claimed). ADVANTAGE - The adhesiveness of metal with respect to graphene is improved, during formation of metallic foil on graphene. DETAILED DESCRIPTION - INDEPENDENT CLAIMS are included for the following: (1) electronic component; (2) manufacture of electronic component; and (3) in-situ electronic device manufacturing apparatus.