▎ 摘　　要

NOVELTY - Method for producing an atomic film, comprises physically peeling an atomic film from a multi-layered atomic film or a layered bulk crystal using a peeling substrate, and transferring the peeled atomic film onto a transfer substrate. USE - The method is used for producing an atomic film (claimed) such as graphene, layered chalcogenide, hexagonal boron nitride, silicene, germanene, and stanene. ADVANTAGE - The method is capable of exfoliating and separating a large-area atomic film from a multi-layered atomic film or a bulk layered crystal. DETAILED DESCRIPTION - An INDEPENDENT CLAIM is included for the atomic film separated from a multilayer atomic film or a layered bulk crystal, where the atomic film has an area of 100 μ m2or more.