• 专利标题:   Method for forming graphene pattern, involves forming pattern layer with target substrate layer, and covering base layer, pattern layer and graphite alkene layer with target substrate layer that is covered with composite layer.
  • 专利号:   CN105070658-A, CN105070658-B
  • 发明人:   CUI C, LV Z, SUN S, ZHANG F
  • 专利权人:   BOE TECHNOLOGY GROUP CO LTD, BOE TECHNOLOGY GROUP CO LTD
  • 国际专利分类:   G02F001/136, H01L021/3213, H01L021/77
  • 专利详细信息:   CN105070658-A 18 Nov 2015 H01L-021/3213 201603 Pages: 10 English
  • 申请详细信息:   CN105070658-A CN10511211 19 Aug 2015
  • 优先权号:   CN10511211

▎ 摘  要

NOVELTY - The method involves forming a pattern layer with a target substrate layer. Graphene pattern agreement is received by performing chemistry film forming process. A graphite alkene layer is covered with the substrate layer. Thickness of the graphene film layer is less than that of the pattern layer. A base layer, the pattern layer and the graphite alkene layer are covered with the target substrate layer that is covered with a composite layer. A graphite alkene layer pattern is covered with the base layer that is fixed with a metal pattern layer. USE - Method for forming graphene pattern (claimed). ADVANTAGE - The method enables reducing processing time and improving production efficiency and mass production in a convenient manner. DETAILED DESCRIPTION - INDEPENDENT CLAIMS are also included for the following: (1) a display device (2) a substrate preparing displaying method (3) a graphene pattern. DESCRIPTION OF DRAWING(S) - The drawing shows a flow diagram illustrating a method for forming graphene pattern. '(Drawing includes non-English language text)'