▎ 摘　　要

NOVELTY - The utility model claims a PECVD-based graphene film coating device, a plurality of vacuum chambers comprising a linear array and the flexible substrate conveying mechanism, flexible substrate conveying mechanism passes through the plurality of vacuum chamber; a plurality of vacuum chamber comprises orderly connected unreeling chamber, a coating chamber and the reeling chamber, each film plating chamber are respectively provided with radio frequency to the target device, a plurality of radio frequency to the target device in the film plating chamber to form a plasma enhanced chemical vapour deposition system, between any two adjacent coating chamber is provided with a gas chamber; the unreeling chamber and the reeling chamber, the coating chamber and the air-separation room are respectively connected with the high vacuum exhausting system. the method is as follows: the vacuum in each vacuum chamber until the vacuum degree reaches the predetermined value, then unreeling chamber discharged into flexible base material and each coating chamber, using the PECVD method for depositing graphene film on flexible substrate surface, at last sent to the reeling for coiling. The utility model has uniform coating, the prepared surface of the flexible base film layer with higher purity.