• 专利标题:   Three-dimensional zero gap semiconductor graphene switching device, has graphene layer surrounding end portion of semiconductor layer, and gate insulation layer surrounding graphene layer, where gate surrounds insulation layer.
  • 专利号:   US2013175506-A1, KR2013081950-A, US9281404-B2, KR1878743-B1
  • 发明人:   HEO J, PARK S, BYUN K, SEO D, SONG H, YANG H, CHUNG H, HEO J S, PARK S J, BYUN K E, SONG H J, YANG H J, CHUNG H J
  • 专利权人:   SAMSUNG ELECTRONICS CO LTD, SAMSUNG ELECTRONICS CO LTD
  • 国际专利分类:   H01L029/786, H01L021/336, H01L029/78, H01L029/06, H01L029/08, H01L029/423
  • 专利详细信息:   US2013175506-A1 11 Jul 2013 H01L-029/786 201347 Pages: 8 English
  • 申请详细信息:   US2013175506-A1 US733304 03 Jan 2013
  • 优先权号:   KR003079, KR030709

▎ 摘  要

NOVELTY - The device has electrodes (42) spaced apart from each other on a substrate. A semiconductor layer (43) and a graphene layer (44) are between the electrodes, where the graphene layer surrounds an end portion of the semiconductor layer. A gate insulation layer (45) surrounds the graphene layer. A gate (46) surrounds the gate insulation layer. The gate insulation layer is on an upper side and on lateral sides of the graphene layer. The electrodes include one of metal, conductive metal oxide, conductive metal nitride, and polysilicon. USE - Three-dimensional (3D) zero gap semiconductor graphene switching device. ADVANTAGE - The device maximizes a contact area between the graphene and layers, and the device density is increased in a limited area. DESCRIPTION OF DRAWING(S) - The drawing shows a schematic view of a 3D graphene switching device. Electrodes (42) Semiconductor layer (43) Graphene layer (44) Gate insulation layer (45) Gate (46)