• 专利标题:   Preparation of bismuth ion mosaic graphene lattice slurry, by adding natural flake graphite powder and chelated bismuth ion delamination agent to reactor, mixing, adding buffer solution, obtaining delamination mixture, and adding impacting agent to delamination mixture to carry out impact reaction.
  • 专利号:   CN115843826-A
  • 发明人:   LI L, PAN F, YIN J, CHEN S, LUO J, XIAO Z, SITU R, LIANG S, MAI Z, CHEN R
  • 专利权人:   WORK TOGETHER MARKETING CONSULTANT LTD
  • 国际专利分类:   A01N059/00, A01N059/16, A01P001/00, A01P003/00, C01B032/19, C01B032/194
  • 专利详细信息:   CN115843826-A 28 Mar 2023 A01N-059/16 202333 Chinese
  • 申请详细信息:   CN115843826-A CN10995327 18 Aug 2022
  • 优先权号:   CN10995327

▎ 摘  要

NOVELTY - A preparation method of bismuth ion mosaic graphene lattice slurry comprises (S1) adding natural flake graphite powder and chelated bismuth ion delamination agent to a reactor, mixing, adding buffer solution, carrying out the reaction, and after the reaction is completed, obtaining a delamination mixture, and (S2) adding an impacting agent to the delamination mixture obtained in step (S1) to carry out an impact reaction, and obtaining a bismuth ion-mosaic graphene lattice slurry after the reaction is completed. USE - The method is used for preparing bismuth ion mosaic graphene lattice slurry, which is used in any one of plastics, masks, clothing or ceramics to play a role of sterilization (claimed). ADVANTAGE - The bismuth ions themselves have the advantages of platinum and gold ions, and are the best material for anti-radiation and radiation protection. DETAILED DESCRIPTION - An INDEPENDENT CLAIM is included for a bismuth ion mosaic graphene lattice slurry obtained by the preparation method.