▎ 摘　　要

NOVELTY - An electron beam-induced in-situ growth manufacturing method of graphene nanoribbons comprises placing silicon wafer on glass slide of electron beam evaporation coating machine, sputtering to form 200 plus minus 10 nm thick copper metal film with nano-level flatness surface, placing on vacuum suction cup of homogenizer, suctioning droplets of 3 wt.% polymethyl methacrylate (PMMA) solution with a molecular weight of 950000 using glue-head dropper on surface of silicon wafer, rotating at speed of 9000 plus minus 200 revolutions/minute, and baking to 180 plus minus 20 degrees C for 5-7 minutes to remove solvent inside the film; and electron beam irradiating at 30 kV voltage and at dosage of 5000-10000 mu m/cm2 until PMMA film in the exposed area will achieve decomposition and desorption of organic molecules and arrangement and reorganization of carbon atoms under the electron beam irradiation, and adding to acetone solution for 10-12 minutes to dissolve the non-irradiated area and removing to obtain graphene nanoribbons. USE - The method is for electron beam-induced in-situ growth manufacturing method of graphene nanoribbons. ADVANTAGE - The method uses electron beam to collide with organic molecules to drive carbon atoms to rearrange and form a graphene crystal structure, helps prepare high-resolution graphene structure, bombards the organic polymer film with electron beam to generate hundreds of degrees of high temperature locally such that copper metal will have an analytical effect on carbon atoms in organic polymers under high temperature environments. The electron beam vacuum exposure system contributes to the high temperature catalysis of the copper substrate on graphene and improve the quality of graphene nanoribbons.