▎ 摘　　要

NOVELTY - The film has a metal base layer (1), a first-level microstructure layer (2), and a second-level nano conductive filling layer (3), where forming the first-level micron structure layer with a rough surface on the metal base layer through a reverse molding process. A conductive layer is coated on the first-level microstructure layer to form the second-level nano conductive filling layer. The first-level micron structure layer is a flexible indium tin oxide (ITO) film with a micron structure. The second-level nano conductive filling layer is a conductive layer formed by coating graphene sheet diluent, carbon nanotube (CNT) and white carbon black diluent. USE - Lunar dust protective conductive film with micro-nano structure. ADVANTAGE - The film reduces the electrostatic force between the moon dust and the protected surface, and achieves a good moon dust protection effect by simultaneously reducing the van der waals force and the electrostatic force between the moon dust and the protected surface. DETAILED DESCRIPTION - An INDEPENDENT CLAIM is included for a method for preparing the moondust protective conductive film with micro-nano structure. DESCRIPTION OF DRAWING(S) - The drawing shows a schematic diagram of the structure of the moondust protective conductive film with a micro-nano structure. Metal base layer (1) First level micron structure layer (2) Second level nano conductive filling layer (3) Third micron structure layer (4)