• 专利标题:   Method for preparing graphene using thin-film chemical vapor deposition device, involves connecting quartz tube with charging system, air pressure regulator and vacuum system by flange, and surrounding quartz tube by heating furnace.
  • 专利号:   CN202913056-U
  • 发明人:   LIAN R, LIU C
  • 专利权人:   XIAMEN XICHENG NEW MATERIAL TECHNOLOGY
  • 国际专利分类:   C23C016/26, C23C016/52
  • 专利详细信息:   CN202913056-U 01 May 2013 C23C-016/26 201366 Pages: 9 Chinese
  • 申请详细信息:   CN202913056-U CN20500089 28 Sep 2012
  • 优先权号:   CN20500089

▎ 摘  要

NOVELTY - This utility model claims a kind of vapour deposition equipment. This utility model is a kind of used for preparing graphene thin film chemical vapour deposition device, wherein the device comprises a quartz tube, said quartz tube through flange is connected with a charging system, the quartz tube through the flange are respectively connected with an air pressure regulator and a vacuum system, wherein the quartz tube is surrounded by heating. Chemical vapour deposition device of this utility model can compatible with normal pressure and vacuum two-kind of a graphene thin film technology, it can realize two different mechanism limit and dialysis of the graphene thin film growth method to realize the whole graphene thin film growth process of real time monitoring and automation.