• 专利标题:   Preparing atomically dispersed metal catalyst used as e.g. thermal catalyst, involves depositing atomically dispersed metal onto water-insoluble support by magnetron sputtering to directly form catalyst containing metal particles.
  • 专利号:   WO2023007192-A1
  • 发明人:   FERNANDES J A
  • 专利权人:   UNIV NOTTINGHAM
  • 国际专利分类:   B01J021/18, B01J023/42, B01J023/46, B01J023/75, B01J023/755, B01J035/00, B01J035/02
  • 专利详细信息:   WO2023007192-A1 02 Feb 2023 B01J-021/18 202314 Pages: 32 English
  • 申请详细信息:   WO2023007192-A1 WOGB052018 29 Jul 2022
  • 优先权号:   GB010894

▎ 摘  要

NOVELTY - Preparing an atomically dispersed metal catalyst (125) involves depositing atomically dispersed metal onto a support (120) by magnetron sputtering to directly form a catalyst containing metal particles with mean diameter up to 1 nm dispersed on the surface of the support. The support is water-insoluble. USE - Preparing atomically dispersed metal catalyst e.g. thermal catalyst, electrocatalyst or photo catalyst (all claimed). ADVANTAGE - The atomically dispersed metal catalyst has high activity and selectivity in many catalytic reactions. The catalyst is thermally stable, photoactive and electrically conductive. DESCRIPTION OF DRAWING(S) - The drawing shows a schematic view of magnetron sputtering deposition of metal to form an atomically dispersed metal catalyst. 101Argon ions 102Metal target 103Atoms 105Drive shaft 106Sample holder 120Support 125Catalyst