• 专利标题:   Channel width controlled large area graphene nanometer belt Fin-FET device, has transfer graphene-containing layer formed on source/drain electrode of substrate, where part of graphene-containing layer is located on medium layer of gate.
  • 专利号:   CN103500761-A, CN103500761-B
  • 发明人:   SUN Q, WANG P, ZHOU P, ZHANG W, DAI Y
  • 专利权人:   UNIV FUDAN
  • 国际专利分类:   H01L021/336, H01L029/10, H01L029/78
  • 专利详细信息:   CN103500761-A 08 Jan 2014 H01L-029/78 201418 Pages: 9 Chinese
  • 申请详细信息:   CN103500761-A CN10454949 28 Sep 2013
  • 优先权号:   CN10454949

▎ 摘  要

NOVELTY - The device has a transfer graphene-containing layer formed on a source/drain electrode of a substrate. An upper part of the transfer graphene-containing layer is located on an upper part of a transfer graphene layer, gate dielectric layer and an upper medium layer of a gate. USE - Channel width controlled large area graphene nanometer belt Fin-FET device. ADVANTAGE - The device can realize large channel width for preparing graphite nano-belt Fin-FET device array. DESCRIPTION OF DRAWING(S) - The drawing shows a schematic view of a channel width controlled large area graphene nanometer belt Fin-FET device.