▎ 摘　　要

NOVELTY - Graphene film is prepared and the surface of the graphene film is covered by mask. The surface of the graphene film exposed to outside is partially removed, such that a surface pattern consistent with the mask pattern is formed. USE - Processing of graphene (claimed). ADVANTAGE - The method enables simple processing of graphene without generation of etching performance deterioration. The processed graphene has excellent workability. DETAILED DESCRIPTION - An INDEPENDENT CLAIM is included for graphene processing device, which comprises mask for covering the surface of the graphene film, and removing unit for removing the surface of the graphene film exposed to outside.