• 专利标题:   Gallium nitride-based LED epitaxial wafer, has metal nanometer particle layer provided with multiple metal nano-particles that are located on graphene layer, where diameter of each metal nano-particles is in specific range.
  • 专利号:   CN209561451-U
  • 发明人:   DING T, ZHOU B, HU J, LI P
  • 专利权人:   HC SEMITEK SUZHOU CO LTD
  • 国际专利分类:   H01L033/00, H01L033/12
  • 专利详细信息:   CN209561451-U 29 Oct 2019 H01L-033/12 201986 Pages: 13 Chinese
  • 申请详细信息:   CN209561451-U CN20258666 28 Feb 2019
  • 优先权号:   CN20258666

▎ 摘  要

NOVELTY - The utility model claims a GaN-based light-emitting diode epitaxial wafer, belonging to the GaN-based light emitting diode field. said light emitting diode epitaxial wafer, comprising: a substrate, a graphene layer sequentially deposited on the substrate, the metal nanometer particle layer, three-dimensional nucleation layer, an un-doped GaN layer, an N-type doped GaN layer, multi-quantum well layer, the electron barrier layer, and a P-type doped GaN layer, the metal nanometre particle layer comprises a plurality of metal nano-particles located on the graphene layer, and each of the metal nano-particles are in contact with the graphene layer, the diameter of the metal nano-particle is 1 to 20nm. adjacent gap exists between the metal nanometer particle.